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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/ ULSI Applications - (Materials Science and Process Technology) (Hardcover)

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for Vlsi/ ULSI Applications - (Materials Science and Process Technology) (Hardcover)
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Last Price: 72.95 USD

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<p/><br></br><p><b> About the Book </b></p></br></br>This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.<p/><br></br><p><b> Book Synopsis </b></p></br></br>This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.<p/><br></br><p><b> Review Quotes </b></p></br></br><br>After reading this book, an engineer should have all the necessary background. - European Semiconductor<br>

Price History

Cheapest price in the interval: 72.95 on November 8, 2021

Most expensive price in the interval: 72.95 on December 22, 2021